Micro-pattering of Siloxane Films by Proton Beam Writing
نویسندگان
چکیده
منابع مشابه
Proton beam writing
the integration of moving parts on a chip, there is expected to Proton beam (p-beam) writing is a new direct-writing process that uses a focused beam of MeV protons to pattern resist material at nanodimensions. The process, although similar in many ways to direct writing using electrons, nevertheless offers some interesting and unique advantages. Protons, being more massive, have deeper penetra...
متن کاملSidewall quality in proton beam writing
Proton beam writing has been shown to allow the fabrication of high aspect ratio nanostructures at sub-100 nm dimension and with smooth and vertical sidewalls. For applications such as the fabrication of waveguides, sidewall smoothness is an important issue. We report results from investigations into side wall roughness measured directly with Atomic Force Microscopy. Structures were written in ...
متن کاملMagnetism in Carbon: Writing Magnetic Structures with a Proton Micro-Beam on Graphite Surfaces
Recent publications demonstrated the generation of magnetic order at room temperature on graphite surfaces after irradiation with protons. In this contribution we show that it is possible to produce magnetic structures in the micrometer range using a proton micro-beam by proton irradiation of the surface of highly oriented pyrolytic graphite samples. The experimental results are compared with m...
متن کاملFabrication of smooth silicon optical devices using proton beam writing
This work gives a brief review of proton beam writing and electrochemical etching process for the fabrication of smooth optical devices in bulk silicon. Various types of structures such as silicon-on-oxidized porous silicon waveguides, waveguide grating and disk resonators have been produced. Optical characterization has been carried out on the waveguides for both TE and TM polarization using f...
متن کاملThe fabrication of x-ray masks using proton beam writing
We have developed a simplified method of fabricating x-ray masks for deep x-ray lithography by using proton beam writing (PBW) without subsequent soft x-ray copying steps. Combining direct PBW and subsequent electroplating, x-ray masks with gold absorber patterns of up to 11 μm height and with vertical and smooth sidewalls were fabricated. The smallest size in the absorber pattern is less than ...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 2009
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.22.239